Yukinori Ochiai

发表

NANOFABRICATION TOWARD SUB-10 NM AND ITS APPLICATION TO NOVEL NANODEVICES

Toshitsugu Sakamoto, Yasunobu Nakamura, Shinji Matsui, 1999 .

EJ-MOSFETs : Toward 10-nm-scale ultimately miniaturized MOSFETs : Special Issue on Nanotechnology

Toshio Baba, Hisao Kawaura, Yukinori Ochiai, 1999 .

Nano-Electron-Beam lithography system and its application for 40-nm gate MOSFETs

Seiji Samukawa, K. Takeuchi, Toyoji Yamamoto, 1996 .

Maskless Etching Of Inp And Gaas By Means Of Ion Beam Assisted Etching

Susumu Namba, Yukinori Ochiai, Kenj i Gamo, 1986, Advanced Lithography.

Hybrid Device Process Using A Focused Ion Beam And An Optical Stepper

Yoshikatsu Kojima, Shinji Matsui, Akira Mochizuki, 1988, Medical Imaging.

Resistance Evaluation and Growth of Carbon Nanotubes

Masahiko Ishida, Yukinori Ochiai, Fumiyuki Nihey, 2006 .

Ten-Nanometer Resolution Nanolithography using Newly Developed 50-kV Electron Beam Direct Writing System

Shinji Matsui, Yukinori Ochiai, Masakazu Baba, 1991 .

Performance of nanomanipulator fabricated on glass capillary by focused-ion-beam chemical vapor deposition

Takayuki Hoshino, Kazuhiro Kanda, Shinji Matsui, 2005 .

Nozzle-Nanostructure Fabrication on Glass Capillary by Focused-Ion-Beam Chemical Vapor Deposition and Etching

Kazuhiro Kanda, Shinji Matsui, K. Watanabe, 2003 .

Cell wall cutting tool and nano-net fabrication by FIB-CVD for subcellular operations and analysis

Takayuki Hoshino, Kazuhiro Kanda, Shinji Matsui, 2006 .

Density estimation for amorphous carbon nanopillars grown by focused ion beam assisted chemical vapor deposition

Masahiko Ishida, Jun-ichi Fujita, Yukinori Ochiai, 2002 .

Horizontally directional single-wall carbon nanotubes grown by chemical vapor deposition with a local electric field

Yukinori Ochiai, Fumiyuki Nihey, Hiroo Hongo, 2007 .

High-resolution, High-purity Calix[n]arene Electron Beam Resist.

Hiromasa Yamamoto, Takahiro Teshima, Jun-ichi Fujita, 2000 .

Lithographic Performance and Mix-and-Match Lithography Using 100 kV Electron Beam System JBX-9300 FS

Yukinori Ochiai, Takashi Ogura, Mitsuru Narihiro, 2001 .

Room temperature replication in spin on glass by nanoimprint technology

Hiroshi Hiroshima, Masanori Komuro, Shinji Matsui, 2001 .

Characteristics of Nano-Electrostatic Actuator Fabricated by Focused Ion Beam Chemical Vapor Deposition

Takayuki Hoshino, Kazuhiro Kanda, Shinji Matsui, 2004 .

Free-space-wiring fabrication in nano-space by focused-ion-beam chemical vapor deposition

Takayuki Hoshino, Kazuhiro Kanda, Shinji Matsui, 2003 .

Nanoimprint using three-dimensional microlens mold made by focused-ion-beam chemical vapor deposition

Takayuki Hoshino, Kazuhiro Kanda, Shinji Matsui, 2004 .

Resolution-Limit Study of Chain-Structure Negative Resist by Electron Beam Lithography

Shinji Matsui, Jun-ichi Fujita, Yukinori Ochiai, 1997 .

Nanolithography Developed Through Electron-Beam-Induced Surface Reaction

Shinji Matsui, Yukinori Ochiai, Masakazu Baba, 1995 .

Calixarene Electron Beam Resist for Nano-Lithography

Toshitsugu Sakamoto, Jun-ichi Fujita, Yukinori Ochiai, 1997 .

Nanomanipulator and actuator fabrication on glass capillary by focused-ion-beam-chemical vapor deposition

Takayuki Hoshino, Kazuhiro Kanda, Shinji Matsui, 2004 .

Transistor characteristics of 14-nm-gate-length EJ-MOSFETs

Toshitsugu Sakamoto, Toshio Baba, Hisao Kawaura, 2000 .

Three-Dimensional Nanoimprint Mold Fabrication by Focused-Ion-Beam Chemical Vapor Deposition

Kazuhiro Kanda, Shinji Matsui, K. Watanabe, 2003 .

Three-dimensional high-performance nano-tools fabricated using focused-ion-beam chemical-vapor-deposition

Takayuki Hoshino, Kazuhiro Kanda, Shinji Matsui, 2005 .

Sub-half-micron lithography for ULSIs

Shinji Matsui, Yukinori Ochiai, Katsumi Suzuki, 2000 .

Calixarenes—prospective materials for nanofabrications

Jun-ichi Fujita, Yukinori Ochiai, S. Matsui, 1997 .

Sub-10-nm-Scale Lithography Using p-chloromethyl-methoxy-calix[4]arene Resist

Masahiko Ishida, Jun-ichi Fujita, Yukinori Ochiai, 2003 .

Growth of three-dimensional nano-structures using FIB-CVD and its mechanical properties

Takashi Kaito, Masahiko Ishida, Jun-ichi Fujita, 2003 .

Fabrication and Characterization of 14-nm-Gate-Length EJ-MOSFETs

Toshitsugu Sakamoto, Toshio Baba, Hisao Kawaura, 1997 .

Sub‐10 nm lithography and development properties of inorganic resist by scanning electron beam

Jaw-Shen Tsai, Shinji Matsui, Jun-ichi Fujita, 1995 .

Observation and characteristics of mechanical vibration in three-dimensional nanostructures and pillars grown by focused ion beam chemical vapor deposition

Toshitsugu Sakamoto, Shinji Matsui, Takashi Kaito, 2001 .

Nanomechanical switch fabrication by focused-ion-beam chemical vapor deposition

Takayuki Hoshino, Kazuhiro Kanda, Shinji Matsui, 2004 .

Ultrahigh resolution of calixarene negative resist in electron beam lithography

Shinji Matsui, Jun-ichi Fujita, Yukinori Ochiai, 1996 .

High‐resolution focused ion beam lithography

Toshiyuki Honda, Yoshikatsu Kojima, Shinji Matsui, 1988 .

Sub-10-nm Electron Beam Lithography Using a Poly(α-methylstyrene) Resist with a Molecular Weight of 650

Jun-ichi Fujita, Yukinori Ochiai, Shoko Manako, 1998 .

Development of three-dimensional pattern-generating system for focused-ion-beam chemical-vapor deposition

Takayuki Hoshino, Kazuhiro Kanda, Shinji Matsui, 2003 .

Estimation of Optimum Electron-Beam Projection Lithography Mask Biases Taking Coulomb Beam Blur into Consideration

Kiyoshi Fujii, Takao Tamura, Yukinori Ochiai, 2003 .

Three-dimensional rotor fabrication by focused-ion-beam chemical-vapor-deposition

Kazuhiro Kanda, Shinji Matsui, Takashi Kaito, 2006 .

Sub-50-nm physical gate length CMOS technology and beyond using steep halo

Tohru Mogami, T. Fukai, H. Wakabayashi, 2002 .

Nanometer‐scale resolution of calixarene negative resist in electron beam lithography

Shinji Matsui, Jun-ichi Fujita, Yukinori Ochiai, 1996 .