Shoko Manako

发表

NANOFABRICATION TOWARD SUB-10 NM AND ITS APPLICATION TO NOVEL NANODEVICES

Toshitsugu Sakamoto, Yasunobu Nakamura, Shinji Matsui, 1999 .

Nano-Electron-Beam lithography system and its application for 40-nm gate MOSFETs

Seiji Samukawa, K. Takeuchi, Toyoji Yamamoto, 1996 .

Sub-1 dB/cm submicrometer-scale amorphous silicon waveguide for backend on-chip optical interconnect.

Emiko Omoda, Toshihiro Kamei, Youichi Sakakibara, 2014, Optics express.

Silicon knife-edge taper waveguide for ultralow-loss spot-size converter fabricated by photolithography

Emiko Omoda, Toshihiro Kamei, M. Mori, 2013 .

High-resolution, High-purity Calix[n]arene Electron Beam Resist.

Hiromasa Yamamoto, Takahiro Teshima, Jun-ichi Fujita, 2000 .

Resolution-Limit Study of Chain-Structure Negative Resist by Electron Beam Lithography

Shinji Matsui, Jun-ichi Fujita, Yukinori Ochiai, 1997 .

Calixarene Electron Beam Resist for Nano-Lithography

Toshitsugu Sakamoto, Jun-ichi Fujita, Yukinori Ochiai, 1997 .

Sub‐10 nm lithography and development properties of inorganic resist by scanning electron beam

Jaw-Shen Tsai, Shinji Matsui, Jun-ichi Fujita, 1995 .

Sub-10-nm Electron Beam Lithography Using a Poly(α-methylstyrene) Resist with a Molecular Weight of 650

Jun-ichi Fujita, Yukinori Ochiai, Shoko Manako, 1998 .