Cedric Monget

Application of plasma-polymerized methylsilane for 0.18-μm photolithography

Cedric Monget, Carol Y. Lee, Olivier Joubert, 1998, Advanced Lithography.

Process optimization of a negative-tone CVD photoresist for 193-nm lithography applications

Cedric Monget, Olivier Joubert, Timothy W. Weidman, 1999, Advanced Lithography.

Patterning critical dimension control for advanced logic nodes

Jonathan Planchot, Pascal Gouraud, Cedric Monget, 2015 .

CVD photoresist performance for 248-nm lithography

Cedric Monget, Timothy W. Weidman, Olivier Toublan, 1999, Advanced Lithography.