Khalid Elbattay

Scanner-to-scanner CD analysis and control in an HVM environment

Austin Peng, Ronald Goossens, Young Seog Kang, 2017, Advanced Lithography.

Lithography performance and simulation accuracy at different polarization states for sub 40nm node

Seung-Chul Oh, Stuart Young, Young-Hong Min, 2008, Lithography Asia.

Process margin improvement through finger-print removal based on scanner leveling data

Jan-Pieter van Delft, Young Jun Kim, Young Seog Kang, 2017, Advanced Lithography.

Contact hole litho correlation with shape analysis

Maurice Janssen, Khalid Elbattay, Carsten Kohler, 2003, European Mask and Lithography Conference.