Michael Cangemi

AAPSM repair utilizing transparent etch stop layer

Matthew Lassiter, Darren Taylor, Michael Cangemi, 2004, SPIE Photomask Technology.

Tunable transmission phase mask options for 65/45nm node gate and contact processing

Will Conley, Jonathan L. Cobb, Michael Cangemi, 2004, SPIE Advanced Lithography.

193-nm EAPSM inspection comparison: commercial versus alternative absorber material

Matthew Lassiter, Darren Taylor, Michael Cangemi, 2003, SPIE Photomask Technology.

Conference of Microelectronic Research 1998

Michael Cangemi, Matthew Scarpino, Jason Benz, 1998 .

Polarization effects: EAPSM vs. TT EAPSM

Will Conley, Michael Cangemi, Marc Cangemi, 2006, European Mask and Lithography Conference.

Implementation of a transparent etch stop layer for an improved alternating PSM

Matthew Lassiter, Darren Taylor, Michael Cangemi, 2004, European Mask and Lithography Conference.

Improved phase uniformity control using a new AAPSM etch stop layer technique

Matthew Lassiter, Darren Taylor, Michael Cangemi, 2003, SPIE Photomask Technology.

Feasibility study of embedded binary masks

Vicky Philipsen, Darren Taylor, Michael Cangemi, 2006, SPIE Photomask Technology.

Improved prediction of across chip linewidth variation (ACLV) with photomask aerial image CD metrology

Will Conley, Michael Cangemi, Eric Poortinga, 2006, SPIE Photomask Technology.