Eric Gullikson

Demonstration of phase-shift masks for extreme-ultraviolet lithography

Christian Chovino, Harry J. Levinson, Adam R. Pawloski, 2006, SPIE Advanced Lithography.

Multisegmented, multilayer-coated mirrors for the Solar Ultraviolet Imager

Regina Soufli, Dennis Martínez-Galarce, David L. Windt, 2013 .

A novel forward-model technique for estimating EUV imaging performance: design and analysis of the SUVI telescope

James Harvey, Regina Soufli, Dennis Martínez-Galarce, 2010, Astronomical Telescopes + Instrumentation.

Monitoring reticle molecular contamination in ASML EUV Alpha Demo Tool

Bruno La Fontaine, Christian Holfeld, Obert Wood, 2010, Advanced Lithography.

Projection optics for EUVL micro-field exposure tools with 0.5 NA

Regina Soufli, Michael Goldstein, Patrick Naulleau, 2014, Advanced Lithography.

Microroughness measurements and EUV calibration of the solar ultraviolet imager multilayer-coated mirrors

Regina Soufli, Dennis Martínez-Galarce, David L. Windt, 2012, Other Conferences.

Experimental verification of EUV mask limitations at high numerical apertures

Andy Neureuther, Patrick Naulleau, Hwan-Seok Seo, 2013, Advanced Lithography.

How we are making the 0.5-NA Berkeley mirco-field exposure tool stable and productive

Carl Cork, Wenhua Zhu, Chris Anderson, 2020, Advanced Lithography.