Mohan Ananth

Investigating inspectability and printability of contamination deposited during SEM analysis

Bryan S. Kasprowicz, Mohan Ananth, Chih-Yu Wang, 2001, SPIE Photomask Technology.

Creating nanohole arrays with the helium ion microscope

Bill Thompson, Mohan Ananth, David C. Ferranti, 2011, Defense + Commercial Sensing.

Reticle OPC defect printability and detectability for 180-nm technology

Larry S. Zurbrick, Maciej W. Rudzinski, Mohan Ananth, 1999, Photomask and Next Generation Lithography Mask Technology.

Initial characterization results of a low-voltage CD SEM for reticle metrology

Mohan Ananth, Richard C. Elliott, Waiman Ng, 1997, Photomask Technology.

Wafer printability simulation accuracy based on UV optical inspection images of reticle defects

Linard Karklin, Larry S. Zurbrick, Maciej W. Rudzinski, 1999, Advanced Lithography.