Joseph G. Garofalo

发表

Focused-ion-beam repair of phase-shift photomasks

Lloyd R. Harriott, Joseph G. Garofalo, Robert L. Kostelak, 1992, Advanced Lithography.

Control and uniformity of 280-nm features in i-line lithography using optical proximity corrections and off-axis illumination

Joseph G. Garofalo, Pat G. Watson, D. Castro, 1997, Advanced Lithography.

Automatic proximity correction for 0.35 /spl mu/m I-line photolithography

Joseph G. Garofalo, Oberdan W. Otto, Chi-Min Yuan, 1994, Proceedings of International Workshop on Numerical Modeling of processes and Devices for Integrated Circuits: NUPAD V.

Automated optical proximity correction: a rules-based approach

Christophe Pierrat, Sheila Vaidya, Joseph G. Garofalo, 1994, Advanced Lithography.

Linesize effects on UV reflectance spectra

Joseph G. Garofalo, David Ziger, Thomas Evans Adams, 1996, Advanced Lithography.

Lithography tricks and tribulations

Raymond A. Cirelli, Joseph G. Garofalo, Pat G. Watson, 1996, Photomask Technology.

Applications of enhanced optical proximity correction models

Joseph G. Garofalo, Jack Q. Zhao, James W. Blatchford, 1998, Advanced Lithography.

Phase-shifting structures for isolated features

Joseph G. Garofalo, Robert L. Kostelak, Tungsheng Yang, 1991, Other Conferences.

Simplified rule generation for automated rules-based optical enhancement

Joseph G. Garofalo, Richard C. Henderson, Oberdan W. Otto, 1995, Photomask Technology.

Impact of optical thin film effects on CD control in DUV lithography

Robert John Socha, Sheila Vaidya, Raymond A. Cirelli, 1995, Advanced Lithography.

Automated layout of mask assist-features for realizing 0.5 k1 ASIC lithography

Sheila Vaidya, Raymond A. Cirelli, Joseph G. Garofalo, 1995, Advanced Lithography.

Reduction of ASIC gate-level line-end shortening by mask compensation

Sheila Vaidya, Joseph G. Garofalo, John DeMarco, 1995, Advanced Lithography.

Application of subresolution phase-shift mask with G-line stepper for sub-half-micrometer gate GaAs circuits

Joseph G. Garofalo, Yih-Cheng Shih, 1994, Advanced Lithography.

Rule-based approach to e-beam and process-induced proximity effect correction for phase-shifting mask fabrication

Christophe Pierrat, Sheila Vaidya, Joseph G. Garofalo, 1994, Advanced Lithography.

Aerial image-based design of rim phase-shift masks with annular illumination

David M. Newmark, Joseph G. Garofalo, Sheila Vaidya, 1993, Advanced Lithography.

LINESIZE EFFECTS ON ULTRAVIOLET REFLECTANCE SPECTRA

David Ziger, Joseph G. Garofalo, Thomas Evans Adams, 1997 .

Exposure characteristics of alternate aperture phase‐shifting masks fabricated using a subtractive process

Christophe Pierrat, Sheila Vaidya, Joseph G. Garofalo, 1992 .

Effects of resist thickness and thin‐film interference in I‐line and deep ultraviolet optical lithography

Sheila Vaidya, Raymond A. Cirelli, Joseph G. Garofalo, 1995 .

Implementing Attenuated Phase Shift Masks for Contacts in Production.

Christophe Pierrat, Joseph G. Garofalo, Victor Pol, 1994 .

Fabrication of phase‐shifting masks with shifter overcoat

Sheila Vaidya, Joseph G. Garofalo, G. Smolinsky, 1991 .

Printing of phase‐shifting mask defects

Christophe Pierrat, Sheila Vaidya, Joseph G. Garofalo, 1993 .