Akihiro Imai

Molecular contamination control technologies for high-volume production phase in high-NA 193nm lithography

Nobuhiro Takahashi, Yoshitaka Matsuda, Junichi Kitano, 2007, SPIE Advanced Lithography.

Clarification of Chip Forming Mechanism by Observation of Transient Phenomenon in Hobbing : Chip Attachment in Different Types of Coating Condition

Yasutsune Ariura, Yoji Umezaki, Akihiro Imai, 2002 .

Molecular contamination control technologies for high volume production in high NA 193-nm lithography (phase II)

Toshiro Nakano, Takashi Tanahashi, Akihiro Imai, 2008, SPIE Advanced Lithography.

Estimation of Driver’s Actions by Using Air Mass Flow Sensors on the Seat Belt

Koji Oguri, Akihiro Imai, Naoki Tokitsu, 2009 .

Molecular contamination control technologies for high NA 193nm lithography

Nobuhiro Takahashi, Junichi Kitano, Masaharu Shioguchi, 2006, SPIE Advanced Lithography.