Ahmad Elayat

Mask process characterization of multiresolution writing

Emile Sahouria, Adam C. Smith, Steffen Schulze, 2012, Other Conferences.

EUV mask-blank defect avoidance solutions assessment

Ahmad Elayat, Peter Thwaite, Steffen Schulze, 2012, Photomask Technology.

Mask write time reduction: deployment of advanced approaches and their impact on established work models

Emile Sahouria, Steffen Schulze, Timothy Lin, 2012, European Mask and Lithography Conference.

Assessment and comparison of different approaches for mask write time reduction

Emile Sahouria, Steffen Schulze, Timothy Lin, 2011, Photomask Technology.

Using pattern shift to avoid blank defects during EUVL mask fabrication

Kazunori Seki, Emily Gallagher, Toshio Konishi, 2013, Photomask and Next Generation Lithography Mask Technology.