Johannes Plauth

Overlay performance on tungsten CMP layers using the ATHENA alignment system

Giovanni Rivera, Guido Miraglia, Laura Rozzoni, 2000, Advanced Lithography.

CD-uniformity for 45nm NV memory on product-stack

Paolo Canestrari, Benedetta Triulzi, Umberto Iessi, 2010, Advanced Lithography.

High-order distortion effects induced by extreme off-axis illuminations at hyper NA lithography

Paolo Canestrari, Lionel Brige, Gianfranco Capetti, 2009, Advanced Lithography.