Shigeto Fukatsu

Time-dependent dielectric breakdown (TDDB) distribution in n-MOSFET with HfSiON gate dielectrics under DC and AC stressing

Masakazu Goto, Kikuo Yamabe, Yuichiro Mitani, 2013, Microelectron. Reliab..

Lifetime prediction of channel hot carrier degradation in pMOSFETs separating NBTI component

Yuichiro Mitani, K. Matsuzawa, Shigeto Fukatsu, 2012, 2012 IEEE International Conference on IC Design & Technology.

Method of Decoupling the Bias Temperature Instability Component from Hot Carrier Degradation in Ultrathin High-k Metal–Oxide–Semiconductor Field-Effect Transistors

Yuichiro Mitani, Shigeto Fukatsu, Izumi Hirano, 2010 .