Peter Voehringer
发表
Dirk Beyer,
Rainer Plontke,
Lutz Bettin,
2004,
European Mask and Lithography Conference.
Dirk Beyer,
Rainer Plontke,
Lutz Bettin,
2003,
SPIE Photomask Technology.
Dirk Beyer,
Martin Tschinkl,
Joerg Butschke,
2003,
Photomask Japan.
Dirk Beyer,
Joerg Butschke,
Mathias Irmscher,
2003,
SPIE Photomask Technology.
Dirk Beyer,
Mitsuru Sato,
Joerg Butschke,
2004,
Photomask Japan.
Dirk Beyer,
Joerg Butschke,
Mathias Irmscher,
2002,
Photomask Japan.
Mask patterning using chemically amplified resists and the novel STEAG HamaTech Blank Coater ASR5000
Dirk Beyer,
Mathias Irmscher,
Corinna Koepernik,
2002,
Photomask Technology.
Mathias Irmscher,
Corinna Koepernik,
Peter Voehringer,
2002,
Photomask Technology.
Peter Voehringer,
Thomas Oliver Henkel,
Peter Alken,
1996,
European Conference on Biomedical Optics.
Axel Feicke,
Joerg Butschke,
Mathias Irmscher,
2004,
SPIE Photomask Technology.
Dirk Beyer,
Rainer Plontke,
Joerg Butschke,
2004,
Photomask Japan.