Paul W. Mertens

Cost-effective cleaning and high-quality thin gate oxides

Guido Groeseneken, D. Martin Knotter, Tanya Nigam, 1999, IBM J. Res. Dev..

Ex Situ Bubble Generation, Enhancing the Particle Removal Rate for Single Wafer Megasonic Cleaning Processes

Vincent Minsier, Frank Holsteyns, Tom Janssens, 2006 .

Influence of environments on the footprint of particle contamination on EUV mask

Herbert Struyf, Marc Heyns, Stefan De Gendt, 2011, Advanced Lithography.