Young Ju Hwang

Wafer scale error induced by bottom antireflective coating

Dong-Seok Kim, Byung-Ho Nam, Young Jin Song, 2001, SPIE Advanced Lithography.

Lens aberration measurement and analysis using a novel pattern

Dong-Seok Kim, Byung-Ho Nam, Young Jin Song, 2001, SPIE Advanced Lithography.

Comparison study between stepper (5x) and scanner (4x) for gate CD control using total process-proximity-based correction

Dong-Seok Kim, Byung-Ho Nam, Sang-Woo Kang, 2001, SPIE Photomask Technology.

Gate CD control for full chip using total-process-proximity-based correction method

Young Jin Song, Jong O. Park, Young Ju Hwang, 2000, Photomask Japan.