Charles Rettner

Computational aspects of optical lithography extension by directed self-assembly

Neal Lafferty, Joy Cheng, Hsinyu Tsai, 2013, Advanced Lithography.

Self-aligned self-assembled organosilicate line patterns of ~20nm half-pitch from block-copolymer mediated self assembly

Ying Zhang, Joy Cheng, Ho-Cheol Kim, 2007, SPIE Advanced Lithography.