Mircea Dusa

发表

Process transfer strategies between ASML immersion scanners

Anton Devilliers, Eric Janda, Yuan He, 2009, Advanced Lithography.

Imaging performance improvements by EUV mask stack optimization

Natalia Davydova, Robert de Kruif, Eelco van Setten, 2011, European Mask and Lithography Conference.

Application of the in-situ dyeing effect for an image reversal resist

Dan V. Nicolau, Mircea Dusa, 1990, Advanced Lithography.

Optical lithography in the sub-50-nm regime

Robert John Socha, Reiner Garreis, Donis G. Flagello, 2004, SPIE Advanced Lithography.

The flash memory battle: How low can we go?

Jo Finders, Eelco van Setten, Mircea Dusa, 2008, SPIE Advanced Lithography.

Interferometric-probe aberration monitors: aerial image and in-resist performance

Garth Robins, Andrew R. Neureuther, Bernd Geh, 2003, SPIE Photomask Technology.

The lithography technology for the 32 nm HP and beyond

Alek C. Chen, Jo Finders, Hans Meiling, 2008, Photomask Japan.

New approach to mask and wafer performance optimization for system-on-a-chip (SOC) devices

Mircea Dusa, Yair Eran, Wolfgang Staud, 2000, Photomask Japan.

Effect of reticle CD uniformity on wafer CD uniformity in the presence of scattering-bar optical proximity correction

Andrew R. Neureuther, Konstantinos Adam, Robert John Socha, 1998, Photomask Technology.

Overlay progress in EUV lithography towards adoption for manufacturing

David Laidler, Eric Hendrickx, Mircea Dusa, 2011, Advanced Lithography.

Mask characterization for double patterning lithography

Brid Connolly, Robert de Kruif, Mircea Dusa, 2007, SPIE Photomask Technology.

Overlay target design characterization and optimization for tungsten CMP

Stephen Hsu, Mircea Dusa, Joost Vlassak, 1998, Advanced Lithography.

Aberration's impact on subresolution contact hole process windows in ultrathin imaging resist

Michael T. Reilly, Jo Finders, Mircea Dusa, 2003, SPIE Advanced Lithography.

Total test repeatability: a new figure of merit for CD metrology tools

Peter Vanoppen, Mircea Dusa, Jeroen Meessen, 2004, SPIE Advanced Lithography.

EUV mask stack optimization for enhanced imaging performance

Natalia Davydova, Robert de Kruif, Eelco van Setten, 2010, Photomask Technology.

Dense lines created by spacer DPT scheme: process control by local dose adjustment using advanced scanner control

Jo Finders, Timon Fliervoet, Mireille Maenhoudt, 2009, Advanced Lithography.

Progress in EUV lithography towards manufacturing from an exposure tool perspective

David Laidler, Eric Hendrickx, Philippe Foubert, 2012, Advanced Lithography.

An integrated lithography concept with application on 45-nm ½ pitch flash memory devices

Jo Finders, Andre Engelen, Mircea Dusa, 2006, SPIE Advanced Lithography.

Litho variations and their impact on the electrical yield of a 32nm node 6T SRAM cell

Geert Vandenberghe, Wim Dehaene, Staf Verhaegen, 2008, SPIE Advanced Lithography.

Evaluating the performance of a 193-nm hyper-NA immersion scanner using scatterometry

Harry J. Levinson, Bruno La Fontaine, Oleg Kritsun, 2007, SPIE Advanced Lithography.

Matching multiple-feature CD response from exposure tools: analysis of error sources with their impact in low-k1 regime

Jo Finders, Mircea Dusa, 2004, SPIE Advanced Lithography.

Characterizing the imaging performance of flash memory masks using AIMS

Jo Finders, Eelco van Setten, Mircea Dusa, 2008, European Mask and Lithography Conference.

Metrology challenges of double exposure and double patterning

William H. Arnold, Mircea Dusa, Jo Flinders, 2007, SPIE Advanced Lithography.

Lithography and yield sensitivity analysis of SRAM scaling for the 32nm node

Geert Vandenberghe, Staf Verhaegen, Mircea Dusa, 2007, SPIE Advanced Lithography.

Litho scenario solutions for FinFET SRAM 22nm node

Tsann-Bim Chiou, Alek C. Chen, Jo Finders, 2009, Lithography Asia.

NXE:3100 full wafer imaging performance and budget verification

Jo Finders, Natalia Davydova, Friso Wittebrood, 2012, European Mask and Lithography Conference.

Design of 200-nm, 170-nm, and 140-nm DUV contact sweeper high-transmission attenuating phase-shift mask: II. Experimental results

Will Conley, Christophe Pierrat, Robert John Socha, 1999, Advanced Lithography.

Interferometric-probe aberration monitor performance in the production environment

Garth Robins, Andrew R. Neureuther, Jongwook Kye, 2004, SPIE Advanced Lithography.

Pitch doubling through dual-patterning lithography challenges in integration and litho budgets

Patrick Jaenen, Jo Finders, Mireille Maenhoudt, 2007, SPIE Advanced Lithography.

Joint optimization of layout and litho for SRAM and logic towards the 20nm node using 193i

Michael C. Smayling, Peter De Bisschop, Mircea Dusa, 2011, Advanced Lithography.

Advanced process control applied to 90-nm lithography and etch

Mircea Dusa, Adolph Hunter, Gowri P. Kota, 2003, SPIE Advanced Lithography.

Experimental study of effect of pellicle on optical proximity fingerprint for 1.35 NA immersion ArF lithography

Lieve Van Look, Geert Vandenberghe, Jan Richter, 2010, Advanced Lithography.

CD control comparison for sub-0.18-μm patterning using 248-nm lithography and strong resolution enhancement techniques

Geert Vandenberghe, Kurt G. Ronse, Robert John Socha, 1999, Advanced Lithography.

Expert system for diagnosis/optimization of microlithography process*

Dan V. Nicolau, Mircea Dusa, Florin Fulga, 1991, Defense, Security, and Sensing.

Mask aspects of EUVL imaging at 27nm node and below

John Zimmerman, Brid Connolly, Natalia Davydova, 2011, Photomask Technology.

Intra-wafer CDU characterization to determine process and focus contributions based on scatterometry metrology

Mircea Dusa, Paul Friedberg, Bhanwar Singh, 2004, SPIE Advanced Lithography.

Characterization, modeling, and impact of scattered light in low-k1 lithography

Harry J. Levinson, Anita Fumar-Pici, Yunfei Deng, 2004, SPIE Advanced Lithography.

The imaging performance of flash memory masks characterized with AIMS

Jo Finders, Eelco van Setten, Mircea Dusa, 2009, Photomask Japan.

Linewidth asymmetry study to predict aberration in lithographic lenses

Harry J. Levinson, Mircea Dusa, Jongwook Kye, 2001, SPIE Advanced Lithography.

Layout optimization and trade-off between 193i and EUV-based patterning for SRAM cells to improve performance and process variability at 7nm technology node

Diederik Verkest, Aaron Thean, Julien Ryckaert, 2015, Advanced Lithography.

22nm logic lithography in the presence of local interconnect

Michael C. Smayling, Robert John Socha, Mircea Dusa, 2010, Advanced Lithography.

Lithographic challenges and their solutions for critical layers in sub-14nm node logic devices

Tsann-Bim Chiou, Alek C. Chen, Mircea Dusa, 2013, Advanced Lithography.

Integrated approach to improving local CD uniformity in EUV patterning

Katja Viatkina, Jan Hermans, Mircea Dusa, 2017, Advanced Lithography.

Application of optical CD for characterization of 70nm dense lines

Mircea Dusa, Hugo Augustinus Joseph Cramer, Ton Kiers, 2005, SPIE Advanced Lithography.

The application of a Rapid Probe Microscope (RPM) for investigating 1D and 2D structures from EUV lithography

Mircea Dusa, Anne-Laure Charley, Lei Feng, 2020, Advanced Lithography.

Patterning challenges in setting up a 16nm node 6T-SRAM device using EUV lithography

Staf Verhaegen, Monique Ercken, Mircea Dusa, 2011, Advanced Lithography.

Evaluating a scatterometry-based focus monitor technique for hyper-NA lithography

Harry J. Levinson, Bruno La Fontaine, Oleg Kritsun, 2007, SPIE Advanced Lithography.

Masks for flash memory gates for the 45nm node: binary or attenuated?

Jo Finders, Eelco van Setten, Andre Engelen, 2007, European Mask and Lithography Conference.

Impact of EUV patterning scenario on different design styles and their ground rules for 7nm/5nm node BEOL layers

Tsann-Bim Chiou, Alek C. Chen, Mircea Dusa, 2016, SPIE Advanced Lithography.

Compensating measured intra-wafer ring oscillator stage delay with intra-wafer exposure dose corrections

Geert Vandenberghe, Jo Finders, Staf Verhaegen, 2006, SPIE Advanced Lithography.

Double patterning for 32nm and below: an update

Jo Finders, Shaunee Cheng, Mireille Maenhoudt, 2008, SPIE Advanced Lithography.

Design compliant source mask optimization (SMO)

Robert John Socha, Tejas Jhaveri, Xiaofeng Liu, 2010, Photomask Japan.

Wafer based mask characterization for double patterning lithography

Brid Connolly, Robert de Kruif, Mircea Dusa, 2008, European Mask and Lithography Conference.

Automatic pitch decomposition for improved process window when printing dense features at k1eff<0.20

Robert John Socha, Donis G. Flagello, Mircea Dusa, 2006, Photomask Japan.

Simulation of connected image reversal and DESIRE techniques for submicron lithography

Dan V. Nicolau, Mircea Dusa, Florin Fulga, 1991, Other Conferences.

Dipole decomposition mask design for full-chip implementation at 100-nm technology node and beyond

Stephen Hsu, Jo Finders, Robert John Socha, 2002, SPIE Advanced Lithography.

Design and analysis of across-chip linewidth variation for printed features at 130 nm and below

Greg Yeric, Robert John Socha, Mircea Dusa, 2000, Advanced Lithography.

Application challenges with double patterning technology (DPT) beyond 45 nm

Vincent Wiaux, Geert Vandenberghe, Jo Finders, 2006, SPIE Photomask Technology.

Comparison of OPC rules and common process windows for 130-nm features using binary and attenuated phase-shift masks

Michael T. Reilly, Robert John Socha, Mircea Dusa, 2000, Advanced Lithography.

In-House Characterization Technique For Steppers

Dan V. Nicolau, Mircea Dusa, 1989, Advanced Lithography.

Reticle consideration for 0.30-μm design rules: between aspiration and actuality

Mircea Dusa, 1996, Photomask and Next Generation Lithography Mask Technology.

Reducing the impact of etch-induced pattern shift on overlay by using lithography and etch tool corrections

Patrick Jaenen, Katja Viatkina, David Hellin, 2017, Advanced Lithography.

Design technology co-optimization for a robust 10nm Metal1 solution for logic design and SRAM

Julien Ryckaert, Mircea Dusa, Sushil Sakhare, 2014, Advanced Lithography.

iN5 EUV single expose patterning evaluation for via layers

Sandip Halder, Mircea Dusa, Victor Blanco, 2021, Photomask Technology.

28nm-pitch Ru interconnects patterned with a 0.33NA-EUV single exposure

Sandip Halder, David Rio, Mircea Dusa, 2021, Photomask Technology.

DUV LITHOGRAPHY (KrF) FOR 130 nm USING OFF-AXIS ILLUMINATION AND ASSISTING FEATURES

Jan van Schoot, Jo Finders, Mircea Dusa, 1999 .