Yong-Suk Lee

发表

Efficient approach to improving pattern fidelity with multi-OPC model and recipe

Jae-Young Choi, Junseok Lee, Munhoe Do, 2006, SPIE Photomask Technology.

A study for effect of rounded contact hole pattern by laser mask writing machine onto wafer process margin

Jae-Young Choi, Jae-Hyun Kang, Yong-Suk Lee, 2006, Photomask Japan.

DEVICE AND METHOD fr TRANSMISSION SYSTEM-diversity by using more than two antennas

Byung-Jae Kwak, Beong-Jo Kim, Yong-Suk Lee, 2001 .

Mask process variation induced OPC accuracy in sub-90nm technology node

Se Jin Park, Jae-Young Choi, Jae-Hyun Kang, 2006, SPIE Advanced Lithography.

Study of optical proximity effects using off-axis illumination with attenuated phase shift mask

Ki-Ho Baik, Chang-Nam Ahn, Yong-Suk Lee, 1995, Advanced Lithography.

Speed Sensorless Vector Control of Induction Motor Using MATLAB/SIMULINK and dSPACE DS1104

Jun-Keun Ji, Yong-Suk Lee, Dong-Min Lee, 2007 .

Characteristics of overlay accuracy after metal CMP process

Young-Keun Kim, Yong-Suk Lee, Won-Kyu Lee, 1997, Advanced Lithography.

Apparatus and method for transmit diversity using more than two antennas.

Byung-Jae Kwak, Sung-Jin Kim, Beong-Jo Kim, 2001 .

A Novel Bandwidth Estimation Model for e-Government Communication Network

Hong-Shik Park, Yong-Suk Lee, Eun-Jung Lee, 2008, 2008 10th International Conference on Advanced Communication Technology.

Simulation based post OPC verification to enhance process window, critical failure analysis, and yield

Jae-Young Choi, Jae-Hyun Kang, Yong-Suk Lee, 2006, SPIE Advanced Lithography.

Effect of System Instability Factors in a Bistatic MTI Radar Using Pulse Chasing Scan Method

Whan-Woo Kim, Yong-Suk Lee, Jin-Mo Yang, 2011 .

Method and apparatus for the estimation of the optimal weight of a transmission diversity of closed loop control in a mobile station

Sung-Jin Kim, Yong-Suk Lee, 2001 .

A method for transmitting antenna diversity, the base station and mobile station for

Kwang Bok Lee, Yong-Suk Lee, Sung-Jin Kim, 2001 .

The study for increasing efficiency of OPC verification by reducing false errors from bending pattern by using different size of CD error non-checking area with various corner lengths

Sang Uk Lee, Yong-Suk Lee, Keeho Kim, 2007, SPIE Advanced Lithography.

CMP and self-shadowing effect of overlay mark in metal sputtering process

Yong-Suk Lee, Se-Jin Park, Hong-Rae Kim, 2003, SPIE Advanced Lithography.

Method and system for adaptive-antenna transmit diversity in a mobile communication system

Sung-Jin Kim, Yong-Suk Lee, Yong-Suk Moon, 2003 .