Junyan Dai

Organoelement resists for EUV lithography

Franco Cerrina, Christopher K. Ober, Lin Wang, 2002, SPIE Advanced Lithography.

Synthesis and evaluation of novel organoelement resists for EUV lithography

Franco Cerrina, Christopher K. Ober, Jangho Shin, 2003, SPIE Advanced Lithography.

Applicaton of blends and side chain Si-O copolymers as high-etch-resistant sub-100-nm e-beam resists

Marie Angelopoulos, Karen Petrillo, Qinghuang Lin, 2002, SPIE Advanced Lithography.

The convergence of top-down and bottom-up nanofabrication: formation of 3D structures

Mingqi Li, Christopher K. Ober, Junyan Dai, 2005, SPIE Optics East.