Nadine Geyer

Sub-100 nm silicon nanowires by laser interference lithography and metal-assisted etching

Nadine Geyer, Volker Schmidt, Ulrich Gösele, 2010, Nanotechnology.

Three-beam interference lithography: upgrading a Lloyd's interferometer for single-exposure hexagonal patterning.

Nadine Geyer, Volker Schmidt, Ulrich Gösele, 2009, Optics letters.

Ordered arrays of vertically aligned [110] silicon nanowires by suppressing the crystallographically preferred <100> etching directions.

Nadine Geyer, Zhang Zhang, Tomohiro Shimizu, 2009, Nano letters.

Metal‐Assisted Chemical Etching of Silicon

Nadine Geyer, Ulrich Goesele, Zhipeng Huang, 2011 .

Model for the Mass Transport during Metal-Assisted Chemical Etching with Contiguous Metal Films As Catalysts

Hartmut S. Leipner, Nadine Geyer, Bodo Fuhrmann, 2012 .