Miki Isawa

Verification and extension of the MBL technique for photo resist pattern shape measurement

Norio Hasegawa, Peter De Bisschop, David Laidler, 2011, Advanced Lithography.

Line edge roughness measurement technique for fingerprint pattern in block copolymer thin film

Hiroshi Yoshida, Roel Gronheid, Paulina A. Rincon Delgadillo, 2013, Advanced Lithography.

Validation of CD-SEM etching residue evaluation technique for MuGFET structures

Tatsuya Maeda, Rita Rooyackers, Kenji Watanabe, 2009, Advanced Lithography.

MuGFET observation and CD measurement by using CD-SEM

Tatsuya Maeda, Rita Rooyackers, Kenji Watanabe, 2008, SPIE Advanced Lithography.

Application of model-based library approach to photoresist pattern shape measurement in advanced lithography

Norio Hasegawa, Shaunee Cheng, Maki Tanaka, 2010, Advanced Lithography.

Calibration studies of pattern top resist loss detection by CD-SEM for advanced lithography process

Shaunee Cheng, Maki Tanaka, Toru Ishimoto, 2011, Advanced Lithography.