Shaun Crawford

Photomask etch system and process for 10nm technology node and beyond

Richard Wistrom, Yoshifumi Sakamoto, Tom Faure, 2015, SPIE Photomask Technology.

Dry etching performance of advanced EUV mask blanks

Richard Wistrom, Emily Gallagher, Tom Faure, 2011, Photomask Technology.

Chrome dry etching for 65-nm node mask manufacturing

Emily Fisch, Thomas B. Faure, Shaun Crawford, 2004, SPIE Photomask Technology.