Catherine C Meister

High-resolution positive photoresists: novolac molecular weight and molecular weight distribution effects

Roger F. Sinta, Pamela Turci, Anthony Zampini, 1990, Advanced Lithography.

Sub-0.30-μm i-line photoresist: formulation strategy and lithographic characterization

Cheng-Bai Xu, Jaclyn J. Yu, Patricia Fallon, 1998, Advanced Lithography.

Profile defects in novolac/DNQ resists: I. formation of microgrooves

Peter Trefonas, Pamela Turci, Michael J. Monaghan, 1995, Advanced Lithography.