Sergei V. Postnikov

发表

Top surface imaging through silylation

Clifford L. Henderson, Jeff D. Byers, C. Grant Willson, 1998, Advanced Lithography.

Evaluation of the critical dimension control requirements in the ITRS using statistical simulation and error budgets

Jonathan L. Cobb, Scott Daniel Hector, Sergei V. Postnikov, 2004, SPIE Advanced Lithography.

Strategies of optical proximity correction dedicated to chromeless phase lithography for 65 and 45 nm node

Will Conley, Kevin Lucas, Bryan S. Kasprowicz, 2004, SPIE Advanced Lithography.

Re-evaluating simple lambda-based design rules for low-K1 lithography process control

Kevin D. Lucas, Sergei V. Postnikov, Karl Wimmer, 2000, Advanced Lithography.

Lithography: Concepts, Challenges and Prospects

Kevin D. Lucas, Scott Daniel Hector, Sergei V. Postnikov, 2003 .

OPC for curved designs in application to photonics on silicon

Sergei V. Postnikov, Patrick Schiavone, Vincent Farys, 2016, Advanced Lithography.

Demonstration of an effective mask proximity correction for advanced photomask

Sergei V. Postnikov, Patrick Schiavone, Luc Martin, 2018, Photomask Japan.

Study of acid transport using IR spectroscopy and SEM

C. Grant Willson, Sergei V. Postnikov, Mark Somervell, 2000, Advanced Lithography.

Monte Carlo method for highly efficient and accurate statistical lithography simulations

Kevin D. Lucas, Sergei V. Postnikov, Karl Wimmer, 2002, SPIE Advanced Lithography.

Status and future of maskless lithography

Laurent Pain, Sergei V. Postnikov, Daniel Henry, 2006 .

CD error budget analysis for 0.18-μm inlaid trench lithography

Chong-Cheng Fu, John L. Sturtevant, Kevin D. Lucas, 1999, Advanced Lithography.

Assessment of complementary double dipole lithography for 45nm and 32nm technologies

Andres Torres, Sergei V. Postnikov, Philippe Thony, 2004, SPIE Advanced Lithography.

Process, design and optical proximity correction requirements for the 65nm device generation

Vincent Wiaux, Geert Vandenberghe, Will Conley, 2003, SPIE Advanced Lithography.

A methodology for double patterning compliant split and design

Vincent Wiaux, Geert Vandenberghe, Mireille Maenhoudt, 2008, Lithography Asia.

Fabrication of integrated circuits with high yield using ultra-thin resist processes

Jonathan L. Cobb, Scott D. Hector, Sergei V. Postnikov, 2003, SPIE Advanced Lithography.

Model-based design improvements for the 100-nm lithography generation

Matthew A. Thompson, Sergei V. Postnikov, Karl Wimmer, 2002, SPIE Advanced Lithography.

Lithographic process window analysis by statistical means

Kevin D. Lucas, Anatoly Bourov, Sergei V. Postnikov, 2002, SPIE Advanced Lithography.

MEV as a new constraint for lithographers in the sub-100-nm regime

Kevin D. Lucas, Jerome Belledent, Sergei V. Postnikov, 2004, SPIE Advanced Lithography.

Mechanistic understanding of line-end shortening

C. Grant Willson, Sergei V. Postnikov, Gerard M. Schmid, 2001, SPIE Advanced Lithography.

Impact of optimized illumination upon simple lambda-based design rules for low-K1 lithography

Kevin D. Lucas, Sergei V. Postnikov, Karl Wimmer, 2001, SPIE Advanced Lithography.

Investigation of product design weaknesses using model-based OPC sensitivity analysis

Kevin D. Lucas, Cesar M. Garza, Sergei V. Postnikov, 2003, SPIE Advanced Lithography.

Critical dimension control in optical lithography

Scott Daniel Hector, Sergei V. Postnikov, C. Garza, 2003 .

Study of resolution limits due to intrinsic bias in chemically amplified photoresists

Sergei V. Postnikov, Michael D. Stewart, David R. Medeiros, 1999 .

MEASUREMENT OF ACID DIFFUSIVITY IN THIN POLYMER FILMS ABOVE AND BELOW Tg

C. Grant Willson, Sergei V. Postnikov, Michael D. Stewart, 2000 .