Qinghuang Lin

发表

Clifford L. Henderson, Jeff D. Byers, C. Grant Willson, 1998, Advanced Lithography.

Feature-shape and line-edge roughness measurement of deep submicron lithographic structures using small-angle neutron scattering

Wen-li Wu, Eric K. Lin, Marie Angelopoulos, 2001, SPIE Advanced Lithography.

Effects of crosslinking agent on lithographic performance of negative-tone resists based on poly(p-hydroxystyrene)

C. Grant Willson, Qinghuang Lin, Ahmad D. Katnani, 1997, Advanced Lithography.

Effects of underlayer on performance of bilayer resists for 248-nm lithography

Marie Angelopoulos, John P. Simons, Qinghuang Lin, 1998, Advanced Lithography.

High-resolution 248-nm bilayer resist

Gregory Breyta, Richard A. Di Pietro, Donald C. Hofer, 1999, Advanced Lithography.

Thermally induced wrinkling in thin-film stacks on patterned substrates

Ganesh Subbarayan, Kartik Srinivasan, Qinghuang Lin, 2009, IBM J. Res. Dev..

Multilevel integration of patternable low-κ material into advanced Cu BEOL

Qinghuang Lin, S. T. Chen, A. Nelson, 2010, Advanced Lithography.

Characterization of thin and ultrathin polymer and resist films

Wen-li Wu, Eric K. Lin, Dario L. Goldfarb, 2001, SPIE Advanced Lithography.

Extension of 248-nm optical lithography: a thin film imaging approach

Donald C. Hofer, Gregory M. Wallraff, Timothy A. Brunner, 1998, Advanced Lithography.

Special Section Guest Editorial: Advanced Plasma-Etch Technology

Ying Zhang, Qinghuang Lin, Gottlieb S. Oehrlein, 2013 .

Line-edge roughness in positive-tone chemically amplified resists: effect of additives and processing conditions

Marie Angelopoulos, Qinghuang Lin, Dario L. Goldfarb, 2001, SPIE Advanced Lithography.

Does line-edge roughness matter?: FEOL and BEOL perspectives

Charles T. Black, Martha I. Sanchez, Qinghuang Lin, 2003, SPIE Advanced Lithography.

Positive bilayer resists for 248- and 193-nm lithography

Richard A. Di Pietro, Donald C. Hofer, Gregory M. Wallraff, 1998, Advanced Lithography.

Extending photo-patternable low-κ concept to 193nm lithography and e-beam lithography

Qinghuang Lin, A. Nelson, P. Brock, 2011, Advanced Lithography.

Water-soluble resist for environmentally friendly lithography

C. Grant Willson, Qinghuang Lin, Jean M. J. Frechet, 1996, Advanced Lithography.

When is bilayer thin-film imaging suitable: comparison with single-layer resists

Scott Halle, Marie Angelopoulos, Qinghuang Lin, 2001, SPIE Advanced Lithography.

Applicaton of blends and side chain Si-O copolymers as high-etch-resistant sub-100-nm e-beam resists

Marie Angelopoulos, Karen Petrillo, Qinghuang Lin, 2002, SPIE Advanced Lithography.

Toward controlled resist line-edge roughness: material origin of line-edge roughness in chemically amplified positive-tone resists

Qinghuang Lin, Wu-Song Huang, Ratnam Sooriyakumaran, 2000, Advanced Lithography.

Building high-performance chemically amplified resists with polymer blends

Marie Angelopoulos, John P. Simons, Qinghuang Lin, 2002, SPIE Advanced Lithography.

Positive- and negative-tone water-processable photoresists: a progress report

C. Grant Willson, Jean M. J. Fréchet, Qinghuang Lin, 1998, Advanced Lithography.

Materials, processes, integration and reliability in advanced interconnects for micro- and nanoelectronics : symposium held April 10-12, 2007, San Francisco, California, U.S.A.

Qinghuang Lin, Processes Integration Materials, Reliability in Advanced Interconnects for Micro, 2007 .

Small Angle X-Ray Scattering Metrology for Sidewall Angle and Cross Section of Nanometer Scale Line Gratings

W. L. Wu, Eric K. Lin, Qinghuang Lin, 2004 .

Advances in Resist Technology and Processing XXIII

Qinghuang Lin, 2006 .

The effects of vacuum ultraviolet radiation on low-k dielectric films

Sebastian Engelmann, Qinghuang Lin, Nicholas C. M. Fuller, 2012 .

Transfer etching of bilayer resists in oxygen-based plasmas

Donald C. Hofer, Marie Angelopoulos, John P. Simons, 2000 .

Measurement of bandgap energies in low-k organosilicates

Qinghuang Lin, Wei Li, Yoshio Nishi, 2014 .

Small angle neutron scattering measurements of nanoscale lithographic features

Wen-li Wu, Eric K. Lin, Qinghuang Lin, 2000 .

Design of photoresists with reduced environmental impact. 1. Water-soluble resists based on photo-cross-linking of poly(vinyl alcohol)

Qinghuang Lin, David R. Medeiros, Carlton G Willson, 1999 .

A Water-Castable, Water-Developable Chemically Amplified Negative-Tone Resist

Qinghuang Lin, David R. Medeiros, Logan L. Simpson, 1997 .

Front Matter: Volume 8685

Ying Zhang, Qinghuang Lin, Gottlieb S. Oehrlein, 2013 .