Chun-Ming Albert Wang

Printing 0.13-μm contact holes using 193-nm attenuated phase-shifting masks

Shy-Jay Lin, Anthony Yen, Chia-Hui Lin, 2001, SPIE Photomask Technology.

Study of pupil filters for depth of focus enhancement in printing contact holes

Anthony Yen, Shinn Sheng Yu, Chun-Ming Albert Wang, 1999, Advanced Lithography.