Wei-Shun Tzeng

Overlay and focus stability control for 28-nm nodes on immersion scanners

Albert Chen, Tsai-Sheng Gau, Jim Chen, 2011, Advanced Lithography.

A paradigm shift in scatterometry-based metrology solution addressing the most stringent needs of today as well as future lithography

Noelle Wright, Maurits van der Schaar, Sophia Wang, 2010, Advanced Lithography.