Richard A. Farrell

Recent advances in very large area avalanche photodiodes

Michael R. Squillante, Mitchell L. Woodring, Gerald Entine, 2003, SPIE Defense + Commercial Sensing.

Fin formation using graphoepitaxy DSA for FinFET device fabrication

Akiteru Ko, Nelson Felix, Nihar Mohanty, 2015, Advanced Lithography.

Avalanche photodiodes for anticoincidence detectors

Michael R. Squillante, Leonard J. Cirignano, Rajani Cuddapah, 1996, Optics & Photonics.

Dual frequency mid-gap capacitively coupled plasma (m-CCP) for conventional and DSA patterning at 10nm node and beyond

Akiteru Ko, Ji Xu, Nihar Mohanty, 2014, Advanced Lithography.

DSA patterning options for FinFET formation at 7nm node

Akiteru Ko, Nelson Felix, Mark Somervell, 2016, SPIE Advanced Lithography.

DSA via hole shrink for advanced node applications

Nelson Felix, Kafai Lai, Martha I. Sanchez, 2016, SPIE Advanced Lithography.

Fabrication of 28nm pitch Si fins with DSA lithography

Akiteru Ko, Ji Xu, Nihar Mohanty, 2013, Advanced Lithography.