J.H. Yeh

Post-WCMP leakage detection and monitoring on 65-nm devices using an advanced e-beam inspection system

Hong Xiao, Mingsheng Tsai, Wei-Yih Wu, 2005, ISSM 2005, IEEE International Symposium on Semiconductor Manufacturing, 2005..

Novel Technique to Identify Systematic and Random Defects during 65 nm and 45nm Process Development for Faster Yield Learning

J.H. Yeh, A. Park, 2007, 2007 IEEE/SEMI Advanced Semiconductor Manufacturing Conference.

Use of /spl mu/Loop/spl trade/ to monitor device specific issues in-line at 65 nm and 90 nm nodes

Mingsheng Tsai, Chung-Ming Wang, J. Lin, 2005, ISSM 2005, IEEE International Symposium on Semiconductor Manufacturing, 2005..