Randall L. Kubena

Selective metal deposition using low-dose focused ion-beam patterning

F. P. Stratton, Thomas Mayer, Randall L. Kubena, 1991, Other Conferences.

Sensitivity and image quality of resists with electron-beam, ion-beam, and optical exposure

Andrew R. Neureuther, C. Grant Willson, Takuya Ogawa, 1998, Advanced Lithography.

Bilevel Polysiloxane Resist For Ion-Beam And Electron-Beam Lithography

R. A. Metzger, Randall L. Kubena, Robert G. Brault, 1985, Advanced Lithography.

Resolution Limits of Focused-Ion-Beam Resist Patterning

Randall L. Kubena, 1992 .

Correlation of frequency, temperature, and bias stability of a Si ring gyro

Richard J. Joyce, Randall L. Kubena, Anthony D. Challoner, 2016, 2016 IEEE International Symposium on Inertial Sensors and Systems.