Hans-Olof Blom

发表

Electrical Characterization of Thin Ta2O5 Films

Jörgen Olsson, Jörgen Westlinder, Hans-Olof Blom, 2001 .

Controlled topography production - True 3D simulation and experiment

Sören Berg, Ilia Katardjiev, Lars Jonsson, 1995 .

Basic studies of the RIBE process applied to the MOS gate spacer technology

Sören Berg, Hans-Olof Blom, Am Barklund, 1990 .

A new self aligned asymmetric lateral bipolar transistor

Jörgen Olsson, Sören Berg, Anders Söderbärg, 1996 .

Analysis and Simulation of Mask Erosion During Etching

Lars Jonsson, Ilia Katardjiev, Christer Hedlund, 1999 .

Titanium silicide films prepared by reactive sputtering

Mikael Östling, Sören Berg, Hans-Olof Blom, 1985 .

Modeling of reactive sputtering of compound materials

Sören Berg, C Nender, Hans-Olof Blom, 1987 .

A comparative study of the diffusion barrier properties of TiN and ZrN

Mikael Östling, Sören Berg, Hans Norström, 1986 .

Predicting thin‐film stoichiometry in reactive sputtering

Sören Berg, C Nender, Hans-Olof Blom, 1988 .

Plasma etching of Hf-based high-k thin films. Part II. Ion-enhanced surface reaction mechanisms

Ryan M. Martin, Jane P. Chang, Hans-Olof Blom, 2009 .

Microloading effect in reactive ion etching

Sören Berg, Christer Hedlund, Hans-Olof Blom, 1994 .

Method for the determination of the angular dependence during dry etching

Carola Strandman, Ylva Bäcklund, Sören Berg, 1995 .

Process modeling of reactive sputtering

Sören Berg, C Nender, Hans-Olof Blom, 1989 .

Three-dimensional simulation of surface evolution during growth and erosion

Sören Berg, Ilia Katardjiev, G. Carter, 1994 .

Angular dependence of the polysilicon etch rate during dry etching in SF6 and Cl2

Sören Berg, Ilia Katardjiev, Christer Hedlund, 1997 .