Jesko Brudermann

Sn DPP source-collector modules: status of alpha resources, beta developments, and the scalability to HVM

Guido Schriever, Willi Neff, Jeroen Jonkers, 2008, SPIE Advanced Lithography.

High-power EUV lithography sources based on gas discharges and laser-produced plasmas

Uwe Stamm, Denis Bolshukhin, Guido Schriever, 2003, SPIE Advanced Lithography.

High-power sources for EUV lithography: state of the art

Uwe Stamm, Denis Bolshukhin, Guido Schriever, 2004, SPIE High-Power Laser Ablation.

EUV source power and lifetime: the most critical issues for EUV lithography

Uwe Stamm, Denis Bolshukhin, Guido Schriever, 2004, SPIE Advanced Lithography.