Loretta M. Shirey

Reactive-ion etching of tungsten for high-resolution x-ray masks

Martin C. Peckerar, Charles R. Eddy, Christie R. Marrian, 1994, Advanced Lithography.

Comparison of dry-etch approaches for tungsten patterning

Martin C. Peckerar, K. W. Rhee, Orest J. Glembocki, 1994, Advanced Lithography.

Postprocessing sequence for liquid-crystal-on-silicon microdisplays

Banahalli R. Ratna, Robert E. Geer, Anno Hermanns, 1999, Electronic Imaging.

Patterning tungsten films with an electron beam lithography system at 50 keV for x-ray mask applications

Martin C. Peckerar, K. W. Rhee, J. M. Andrews, 1991 .

Reactive ion etching of high‐aspect‐ratio 100 nm linewidth features in tungsten

Martin C. Peckerar, K. W. Rhee, William Chu, 1994 .

Imaging layers for 50 kV electron beam lithography: Selective displacement of noncovalently bound amine ligands from a siloxane host film

Mu-San Chen, K. W. Rhee, Walter J. Dressick, 2001 .