John Kosakowski

Reactive-ion etching of tungsten for high-resolution x-ray masks

Martin C. Peckerar, Charles R. Eddy, Christie R. Marrian, 1994, Advanced Lithography.

The Benefits of Information Technology.

John Kosakowski, Jack E. Kosakowski, John Kosakowski, 2000 .

Comparison of dry-etch approaches for tungsten patterning

Martin C. Peckerar, K. W. Rhee, Orest J. Glembocki, 1994, Advanced Lithography.

The Benefits of Information Technology. ERIC Digest.

John Kosakowski, Jack E. Kosakowski, 1998 .

Reactive ion etching of high‐aspect‐ratio 100 nm linewidth features in tungsten

Martin C. Peckerar, K. W. Rhee, William Chu, 1994 .

Passive microelectrode arrays for recording of neural signals: A simplified fabrication process

Milton Rebbert, Shihab A. Shamma, Martin Peckerar, 1991 .