Shusuke Yoshitake

Practical approach to evaluating mask CD uniformity patterned by a variable-shaped beam

Hideaki Sakurai, Masamitsu Itoh, Noriaki Nakayamada, 1997, Photomask Technology.

Overlay accuracy of EUV1 using compensation method for nonflatness of mask

Kazuya Ota, Osamu Suga, Yuusuke Tanaka, 2011, Advanced Lithography.

Eddy current evaluation for a high-resolution EB system

Jun Takamatsu, Munehiro Ogasawara, Shusuke Yoshitake, 2001, SPIE Photomask Technology.

Desired IP control methodology for EUV mask in current mask process

Munehiro Ogasawara, Shusuke Yoshitake, Shuichi Tamamushi, 2008, European Mask and Lithography Conference.

Optical column of the mask-scan EB mask writer test stand

Jun Takamatsu, Munehiro Ogasawara, Shusuke Yoshitake, 2000, Photomask Japan.

EB alignment function for defect mitigation of EUV blank

Munehiro Ogasawara, Shusuke Yoshitake, Tomohiro Iijima, 2012, Other Conferences.

Fundamental study on dissolution behavior of poly(methyl methacrylate) by quartz crystal microbalance

Hiroki Yamamoto, Takahiro Kozawa, Shusuke Yoshitake, 2016, SPIE Advanced Lithography.

Enhancement of global CD correction and data processing in EB mask writer EBM-8000

Yasuo Kato, Jun Yashima, Noriaki Nakayamada, 2011, Photomask Technology.

Key improvement schemes of accuracies in EB mask writing for double patterning lithography

Jun Takamatsu, Takashi Kamikubo, Hirohito Anze, 2008, European Mask and Lithography Conference.