A. Torre

发表

The first Italian micro exposure tool for EUV lithography: design guidelines and experimental results

D. Murra, Francesco Flora, Sarah Bollanti, 2009 .

Enea Extreme Ultraviolet Lithography Micro-Exposure Tool Main Features

D. Murra, Francesco Flora, Sarah Bollanti, 2014 .

Excimer-Laser-Driven EUV Plasma Source for Single-Shot Projection Lithography

P. Di Lazzaro, F. Flora, L. Mezi, 2009, IEEE Transactions on Plasma Science.

Is this artwork original or is it a copy? The answer by a new anti-counterfeiting tag

D. Murra, Francesco Flora, Sarah Bollanti, 2012 .

First results of high-resolution patterning by the ENEA laboratory-scale extreme ultraviolet projection lithography system

Francesco Flora, Sarah Bollanti, P. Di Lazzaro, 2008 .

Further comparisons between the conventional and the modified Schwarzschild objectives

P. Di Lazzaro, F. Flora, L. Mezi, 2008 .

Analytical propagation of supergaussian-like beams in the far-field

Sarah Bollanti, P. Di Lazzaro, Daniele Murra, 1997 .

Invisible marking system by extreme ultraviolet radiation: the new frontier for anti-counterfeiting tags

D. Murra, Francesco Flora, Sarah Bollanti, 2016 .

New technique for aberration diagnostics and alignment of an extreme ultraviolet Schwarzschild objective

Francesco Flora, Sarah Bollanti, P. Di Lazzaro, 2013 .

Laser–plasma–source debris-related investigations: an aspect of the ENEA micro-exposure tool

Francesco Flora, Sarah Bollanti, P. Di Lazzaro, 2009 .

Conventional and modified Schwarzschild objective for EUV lithography: design relations

P. Di Lazzaro, F. Flora, L. Mezi, 2006 .

Space- and time-resolved diagnostics of the ENEA EUV discharge-produced-plasma source used for metrology and other applications

Francesco Flora, Sarah Bollanti, P. Di Lazzaro, 2015 .