Deenesh Padhi

Wafer edge polishing process for defect reduction during immersion lithography

Chris Ngai, Abraham Anapolsky, Motoya Okazaki, 2008, SPIE Advanced Lithography.

Defect gallery and bump defect reduction in the self Aligned Double Patterning module

Chris Ngai, Cathy Cai, Deenesh Padhi, 2010, 2010 IEEE/SEMI Advanced Semiconductor Manufacturing Conference (ASMC).

Effect of electron flow direction on model parameters of electromigration-induced failure of copper interconnects

Deenesh Padhi, Girish Dixit, 2003 .