Juergen Gramss
发表
Michael Kramer,
Juergen Gramss,
Melchior Lemke,
2003,
Photomask Japan.
Katja Keil,
Johannes Kretz,
Kang-Hoon Choi,
2007,
European Mask and Lithography Conference.
Hans Eisenmann,
Uwe Baetz,
Nikola Belic,
2001,
European Mask and Lithography Conference.
Fast layout data processing and repetitive structure exposure for high-throughput e-beam lithography
Uwe Baetz,
Juergen Gramss,
Hans Eichhorn,
1996,
Advanced Lithography.
Klaus Kunze,
Bernd Schnabel,
D. Melzer,
2002,
European Mask and Lithography Conference.
Hans-Joachim Doering,
Gerhard Schubert,
Juergen Gramss,
2000,
European Mask and Lithography Conference.
Dirk Beyer,
Klaus Kunze,
Nikola Belic,
2006,
European Mask and Lithography Conference.
Hans-Joachim Doering,
Johannes Kretz,
Laurent Pain,
2007,
European Mask and Lithography Conference.
Martin Sczyrba,
Hans-Joachim Doering,
Martin Bloecker,
2010,
Photomask Technology.
Christian Ehrlich,
Juergen Gramss,
1998,
Photomask and Next Generation Lithography Mask Technology.
Hans-Joachim Doering,
Christian Ehrlich,
Juergen Gramss,
1999,
Photomask and Next Generation Lithography Mask Technology.
Hans-Joachim Doering,
Ulf Weidenmueller,
Monika Boettcher,
2011,
European Mask and Lithography Conference.