Shunko Magoshi

发表

Evaluation result of Selete's exposure tool: impact of the source performance

Kazuo Tawarayama, Shunko Magoshi, Hajime Aoyama, 2008, SPIE Advanced Lithography.

Resolution capability of SFET with slit and dipole illumination

Kazuo Tawarayama, Shunko Magoshi, Yuusuke Tanaka, 2011, Advanced Lithography.

Linewidth controllability depending on electron-beam blur and resist thickness

Shunko Magoshi, Masamitsu Itoh, Atsushi Ando, 1998, Advanced Lithography.

Mask 3D effect reduction and defect printability of etched multilayer EUV mask

Yasutaka Morikawa, Satoshi Tanaka, Shunko Magoshi, 2019, Advanced Lithography.

Process liability evaluation for beyond 22nm node using EUVL

Kazuo Tawarayama, Shunko Magoshi, Hajime Aoyama, 2010, Advanced Lithography.

Recent progress of EUV full-field exposure tool in Selete

Kazuo Tawarayama, Shunko Magoshi, Hajime Aoyama, 2009, Advanced Lithography.

High-Speed Electron Beam Data Conversion System Combining Hierarchical Operation with Parallel Processing

Shunko Magoshi, Kiyomi Koyama, Susumu Watanabe, 1992 .

Manufacturability of 2x-nm devices with EUV tool

Kazuo Tawarayama, Shunko Magoshi, Hajime Aoyama, 2011, Advanced Lithography.

Fabrication of 35nm via-hole patterns for interconnect test chips with EUV lithography

Kazuo Tawarayama, Shunko Magoshi, Hajime Aoyama, 2010, Advanced Lithography.

Pattern-data preparation method to enhance high-throughput mask fabrication in variable-shaped e-beam writing system

Shunko Magoshi, Shinji Sakamoto, Hirohito Anze, 1996, Photomask and Next Generation Lithography Mask Technology.

Data conversion system for character projection-type low-energy electron beam direct writing system

Shunko Magoshi, Ryo Yamada, Ryoichi Inanami, 2006, SPIE Advanced Lithography.

Performance evaluation of source collector module for extreme ultraviolet small-field exposure tool

Kazuo Tawarayama, Shunko Magoshi, Yuusuke Tanaka, 2009, Advanced Lithography.

Fabrication of half-pitch 32-45-nm SRAM patterns with EUVL

Kazuo Tawarayama, Shunko Magoshi, Hajime Aoyama, 2009, Advanced Lithography.

Study of EB-tree

Kazuo Tawarayama, Shunko Magoshi, Masayuki Hatano, 2005, SPIE Advanced Lithography.

Effects of aberration and flare on lithographic performance of SFET

Kazuo Tawarayama, Shunko Magoshi, Hajime Aoyama, 2008, SPIE Advanced Lithography.

Character Projection EB Data Conversion System Combined with Throughput Analyzer

Shunko Magoshi, Shigehiro Hara, Kiyomi Koyama, 1994 .

Current development status of HSFET (High NA Small Field Exposure Tool) in EIDEC

Shunko Magoshi, Satoshi Tanaka, Soichi Inoue, 2016, SPIE Advanced Lithography.

Proximity effect correction on the multilevel interconnect metal for high-energy electron-beam lithography

Kazuo Tawarayama, Shunko Magoshi, Shinji Sato, 2003, SPIE Advanced Lithography.

Maskless lithography: estimation of the number of shots for each layer in a logic device with character-projection-type low-energy electron-beam direct writing system

Shunko Magoshi, Ichiro Mori, Ryoichi Inanami, 2003, SPIE Advanced Lithography.

Self-aligned double patterning process for sub-15nm nanoimprint template fabrication

Shunko Magoshi, Hideaki Sakurai, Kosuke Takai, 2021, Photomask Japan.

Contamination Charging up Effect in a Variably Shaped Electron Beam Writer

Shunko Magoshi, Atsushi Ando, Hitoshi Sunaoshi, 1996 .

Enhancing a hierarchical, parallel electron beam data conversion processor toward 1 Gbit memory lithography

Shunko Magoshi, Shigehiro Hara, Kiyomi Koyama, 1995 .

Throughput enhancement strategy of maskless electron beam direct writing for logic device

Tadahiro Kuroda, Shunko Magoshi, Katsuya Okumura, 2000, International Electron Devices Meeting 2000. Technical Digest. IEDM (Cat. No.00CH37138).

Lithographic Performance of Extreme Ultravolet Full-Field Exposure Tool at Selete

Kazuo Tawarayama, Shunko Magoshi, Hajime Aoyama, 2009 .

Extreme Ultraviolet Lithography Using Small-Field Exposure Tool: Current Status

Kazuo Tawarayama, Shunko Magoshi, Yuusuke Tanaka, 2008 .