Dan Hung

Advanced mask data processing for 32nm and beyond

Johnny Yeap, Raghava Kondepudy, John Nogatch, 2008, Photomask Japan.

Integration of OPC and mask data preparation for reduced data I/O and reduced cycle time

Manoj Chacko, Johnny Yeap, Mathias Boman, 2007, SPIE Photomask Technology.

Bottlenecks in data preparation flow for multi-beam direct write

Alex Zepka, Dan Hung, Otto Meijer, 2011, Photomask Technology.