Dan Rost

Qualification of aerial image 193nm inspection tool for all masks and all process steps

Dan Rost, Raunak Mann, Ryan Gardner, 2008, Photomask Japan.

Aera193i: aerial imaging mask inspection for immersion lithography

Shmoolik Mangan, Dan Rost, Raunak Mann, 2007, SPIE Advanced Lithography.

Novel lithography approach using feed-forward mask-based wafer CDU correction increase fab productivity and yield

Jo Finders, Baukje Wisse, Shmoolik Mangan, 2009, Advanced Lithography.

Controlling phase induced CD non-uniformity effects of PSM photo-masks

Lior Shoval, Dan Rost, Michael Ben-Yishai, 2008, Photomask Japan.

Automatic classification of blank substrate defects

Dan Rost, Peter Buck, Sankaranarayanan Paninjath, 2014, Photomask Technology.