James S. Clarke

Linewidth roughness and cross-sectional measurements of sub-50 nm structures with CD-SAXS and CD-SEM

Wen-li Wu, Eric K. Lin, Benjamin Bunday, 2008, SPIE Advanced Lithography.

Electron transport properties of sub-3-nm diameter copper nanowires

John J. Plombon, James S. Clarke, Sarah L.T. Jones, 2015, 1609.06160.

Process technology scaling in an increasingly interconnect dominated world

Christopher George, James S. Clarke, Christopher Jezewski, 2014, 2014 Symposium on VLSI Technology (VLSI-Technology): Digest of Technical Papers.

Design and Analysis of Superconducting Qubits for Extensible Surface Coding

James S. Clarke, L. DiCarlo, C. C. Bultink, 2018 .

Impact of qubit connectivity on quantum algorithm performance

James S. Clarke, Gian Giacomo Guerreschi, Sonika Johri, 2018, Quantum Science and Technology.

Line edge roughness characterization of sub-50nm structures using CD-SAXS: round-robin benchmark results

Bryan J. Rice, Wen-li Wu, Eric K. Lin, 2007, SPIE Advanced Lithography.

Enhancing a Near-Term Quantum Accelerator's Instruction Set Architecture for Materials Science Applications

Sonika Johri, James S. Clarke, M. A. Rol, 2020, IEEE Transactions on Quantum Engineering.

Demonstration of full-field patterning of 32 nm test chips using EUVL

James S. Clarke, Guojing Zhang, Manish Chandhok, 2009, Advanced Lithography.

CD-SAXS measurements using laboratory-based and synchrotron-based instruments

Wen-li Wu, Eric K. Lin, Benjamin Bunday, 2008, SPIE Advanced Lithography.

The Potential Subversion of Biometric Measurements

James S. Clarke, Christopher Celaya, 2014 .