John S. Villarrubia

发表

Linewidth roughness and cross-sectional measurements of sub-50 nm structures with CD-SAXS and CD-SEM

Wen-li Wu, Eric K. Lin, Benjamin Bunday, 2008, SPIE Advanced Lithography.

Electrical test structures replicated in silicon-on-insulator material

Richard A. Allen, John S. Villarrubia, Michael W. Cresswell, 1996, Advanced Lithography.

New way of handling dimensional measurement results for integrated circuit technology

Michael T. Postek, John S. Villarrubia, Andras E. Vladar, 2003, SPIE Advanced Lithography.

Scanning electron microscope analog of scatterometry

Jeremiah R. Lowney, Michael T. Postek, John S. Villarrubia, 2002, SPIE Advanced Lithography.

Simulation study of repeatability and bias in the CD-SEM

Michael T. Postek, John S. Villarrubia, Andras E. Vladar, 2003, SPIE Advanced Lithography.

CD-SEM measurement line edge roughness test patterns for 193 nm lithography

John S. Villarrubia, Andras E. Vladar, Michael Bishop, 2003, SPIE Advanced Lithography.

Strategy for faster blind reconstruction of tip geometry for scanned probe microscopy

John S. Villarrubia, 1998, Advanced Lithography.

Developing a method to determine linewidth based on counting the atom spacings across a line

Carsten P. Jensen, John S. Villarrubia, Richard M. Silver, 1998, Advanced Lithography.

Shape-Sensitive Linewidth Measurement with the SEM Using a Model-Based Library | NIST

Jeremiah R. Lowney, Michael T. Postek, John S. Villarrubia, 2001 .

Progress on accurate metrology of pitch, height, roughness, and width artifacts using an atomic force microscope

John S. Villarrubia, Jason Schneir, Ellen D. Williams, 1995, Advanced Lithography.

Determination of optimal parameters for CD-SEM measurement of line-edge roughness

John S. Villarrubia, Theodore V. Vorburger, Andras E. Vladar, 2004, SPIE Advanced Lithography.

Edge determination for polycrystalline silicon lines on gate oxide

Jeremiah R. Lowney, Michael T. Postek, John S. Villarrubia, 2001, SPIE Advanced Lithography.

Bias reduction in roughness measurement through SEM noise removal

Benjamin Bunday, John S. Villarrubia, Ram Peltinov, 2006, SPIE Advanced Lithography.

Toward nanometer accuracy measurements

John S. Villarrubia, David E. Gilsinn, E. Clayton Teague, 1999, Advanced Lithography.

Line edge roughness characterization of sub-50nm structures using CD-SAXS: round-robin benchmark results

Bryan J. Rice, Wen-li Wu, Eric K. Lin, 2007, SPIE Advanced Lithography.

Is a production-level scanning electron microscope linewidth standard possible?

Michael T. Postek, John S. Villarrubia, Andras E. Vladar, 2000, Advanced Lithography.

Intercomparison of SEM, AFM, and electrical linewidths

Richard A. Allen, Jeremiah R. Lowney, Michael T. Postek, 1999, Advanced Lithography.

Scanning electron microscope dimensional metrology using a model‐based library

Michael T. Postek, John S. Villarrubia, András E. Vladár, 2005 .

Linewidth measurement intercomparison on a BESOI sample

Richard A. Allen, Jeremiah R. Lowney, Michael T. Postek, 2000, Advanced Lithography.

Sensitivity of SEM width measurements to model assumptions

John S. Villarrubia, Zejun Ding, 2009, Advanced Lithography.

Monte Carlo modeling of secondary electron imaging in three dimensions

Jeremiah R. Lowney, John S. Villarrubia, Nicholas W. M. Ritchie, 2007, SPIE Advanced Lithography.

THE MOLECULAR MEASURING MACHINE

John S. Villarrubia, E Amatucci, Fredric Scire, 1998 .

NIST Simulation of E-beam Inspection and CD-SEM in-line metrology: Final Report | NIST

John S. Villarrubia, 2011 .

Influence of focus variation on linewidth measurements

John S. Villarrubia, Andras E. Vladar, Maki Tanaka, 2005, SPIE Advanced Lithography.

CD-SEM measurement line-edge roughness test patterns for 193-nm lithography

John S. Villarrubia, Andras E. Vladar, Michael Bishop, 2003, SPIE Advanced Lithography.

NIST Simulation of E-beam Inspection and CD-SEM in-line metrology: Interim Report for 1st year of project | NIST

John S. Villarrubia, 2010 .

Image simulation and surface reconstruction of undercut features in atomic force microscopy

Ronald G. Dixson, John S. Villarrubia, Xiaoping Qian, 2007, SPIE Advanced Lithography.

Grating pitch measurements with the molecular measuring machine

John S. Villarrubia, E C. Teague, John A. Kramar, 1999, Optics & Photonics.

An a Posteriori Error Estimate for Scanning Electron Microscope Simulation with Adaptive Mesh Refinement

John S. Villarrubia, William F. Mitchell, W. Mitchell, 2019, Journal of Scientific Computing.

Scanning electron microscopy imaging of ultra-high aspect ratio hole features

Benjamin Bunday, John S. Villarrubia, Aron Cepler, 2012, Advanced Lithography.

Exploring and Extending the Limits of CD-SEMs' Resolution | NIST

Michael T. Postek, John S. Villarrubia, Andras Vladar, 2003 .

10 nm Three-Dimensional CD-SEM Metrology | NIST

Michael T. Postek, John S. Villarrubia, András E. Vladár, 2014 .

Comparison of Electron Imaging Modes for Dimensional Measurements in the Scanning Electron Microscope †

Michael T. Postek, John S. Villarrubia, András E. Vladár, 2016, Microscopy and Microanalysis.

Super-resolution and ultrahigh-throughput of focused-ion-beam machining

Joshua Schumacher, John S. Villarrubia, J. Alexander Liddle, 2020 .

Nanoindentation of polymers: an overview

John S. Villarrubia, William F. Guthrie, Greg Meyers, 2001 .

Three-Dimensional (3D) Nanometrology Based on Scanning Electron Microscope (SEM) Stereophotogrammetry †

John S. Villarrubia, András E. Vladár, J. Villarrubia, 2017, Microscopy and Microanalysis.

Nanoindentation of Polymers: An Overview | NIST

John S. Villarrubia, William F. Guthrie, Greg Meyers, 2001 .

A Simulation Study of Repeatability and Bias in the CD-SEM | NIST

Michael T. Postek, John S. Villarrubia, András E. Vladár, 2003 .

Experimental test of blind tip reconstruction for scanning probe microscopy

Michael T. Postek, John S. Villarrubia, Thomas B. Renegar, 2000 .

Increasing the value of atomic force microscopy process metrology using a high‐accuracy scanner, tip characterization, and morphological image analysis

Ronald G. Dixson, John S. Villarrubia, T Mcwaid, 1996 .

Issues in Line Edge and Linewidth Roughness Metrology

John S. Villarrubia, J. Villarrubia, 2005 .

Tip Characterization for Dimensional Nanometrology

John S. Villarrubia, J. Villarrubia, 2004 .

Sensitivity of scanning electron microscope width measurements to model assumptions

John S. Villarrubia, J. Villarrubia, Z. Ding, 2009 .

Stylus Tip-Size Effect on the Calibration of Periodic Roughness Specimens with Rectangular Profiles | NIST

Jun-Feng Song, John S. Villarrubia, Theodore V. Vorburger, 2012 .

Tip and Surface Reconstruction in Scanned Probe Microscopy

John S. Villarrubia, 1997 .