Charles W. Gwyn

Static microfield printing at the Advanced Light Source with the ETS Set-2 optic

Pei-yang Yan, Richard H. Stulen, Donald W. Sweeney, 2002, SPIE Advanced Lithography.

EUVL: transition from research to commercialization

Peter J. Silverman, Charles W. Gwyn, 2003, Photomask Japan.

Lithographic evaluation of the EUV engineering test stand

Pei-yang Yan, Donald W. Sweeney, Kenneth A. Goldberg, 2002, SPIE Advanced Lithography.

Initial results from the EUV engineering test stand

Pei-yang Yan, Richard H. Stulen, Donald W. Sweeney, 2001, SPIE Optics + Photonics.

System integration and performance of the EUV engineering test stand

Pei-yang Yan, Richard H. Stulen, Donald W. Sweeney, 2001, SPIE Advanced Lithography.

Predictive model of the cost of extreme-ultraviolet lithography masks

Pei-yang Yan, Scott D. Hector, Patrick A. Kearney, 2001, SPIE Photomask Technology.