Gina L. Weibel

Dissolution rate measurements for resist processing in supercritical carbon dioxide

Christopher K. Ober, Victor Q. Pham, Gina L. Weibel, 2002, SPIE Advanced Lithography.

Design strategies for 157-nm single-layer photoresists: lithographic evaluation of a poly(α -trifluoromethyl vinyl alcohol) copolymer

Dirk Schmaljohann, Christopher K. Ober, Alyssandrea H. Hamad, 2000, Advanced Lithography.

Fundamental Studies of Fluoropolymer Photoresists for 157 nm Lithography.

Junyan Dai, Dirk Schmaljohann, Christopher K. Ober, 2000 .

POSITIVE-TONE RESIST FOR SUPERCRITICAL CO 2 PROCESSING

Christopher K. Ober, Victor Q. Pham, Gina L. Weibel, 2002 .

An overview of supercritical CO 2 applications in microelectronics processing

Christopher K. Ober, Gina L. Weibel, C. Ober, 2003 .

Processing Polymers in Supercritical CO2

Gina L. Weibel, C. Ober, 2002 .

E‐Beam Patterning of Hot‐Filament CVD Fluorocarbon Films Using Supercritical CO2 as a Developer

Gina L. Weibel, C. Ober, K. Gleason, 2001 .