Masayuki Hiroi

Process and structure designs for high performance Cu low-k interconnects : Special issue on advanced semiconductor processing technology

Yoshihiro Hayashi, Shinobu Saito, Jun Kawahara, 2001 .

A 'self-aligned' selective MBE technology for high-performance bipolar transistors

F. Sato, Tsutomu Tashiro, Hisashi Takemura, 1990, International Technical Digest on Electron Devices.

Accurate Modeling Method for Cu Interconnect

Norio Okada, Makoto Yasuda, Manabu Iguchi, 2008, IEICE Trans. Electron..

Highly thermal-stable, plasma-polymerized BCB polymer film (k=2.6) for Cu dual-damascene interconnects

Yoshihiro Hayashi, Kuniko Kikuta, Akira Furuya, 2000, 2000 Symposium on VLSI Technology. Digest of Technical Papers (Cat. No.00CH37104).

Etching characteristics of Si1−xGex alloy in ammoniac wet cleaning

Toru Tatsumi, Hiroyuki Hirayama, Masayuki Hiroi, 1990 .