Joshua Lessing

发表

Advancements in focused ion beam repair of alternating phase-shift masks

Tod Robinson, Joshua Lessing, Troy Morrision, 2003, SPIE Photomask Technology.

Repair and printability study of binary chrome masks with OPC features for 0.18-μm technology node

Jeff Kuo, Diane K. Stewart, David C. Ferranti, 1999, Photomask Technology.

Edge-placement accuracy of opaque and clear defect repairs using focused ion beam technology

Diane K. Stewart, K. Rose, Mark L. Raphaelian, 1997, Photomask Technology.