John G. Maltabes

Increasing effective resolution through surface conditioners for 1x imprint templates, and photo mask applications beyond 65nm

Peng Zhang, Madhukar Bhaskara Rao, Kosta S. Selinidis, 2006, SPIE Advanced Lithography.

Cost/benefit analysis of mix-and-match lithography for production of half-micron devices

Mark C. Hakey, Alan L. Levine, John G. Maltabes, 1993, Advanced Lithography.