Chao-Yu Harvey Cheng

Fast and accurate scatterometry metrology method for STI CMP step height process evaluation

Chih-Hsun Lin, Chia-Lin Hsu, Houssam Chouaib, 2012, Advanced Lithography.

Apply multiple target for advanced gate ADI critical dimension measurement by scatterometry technology

Howard Chen, Sungchul Yoo, Chun-Chi Yu, 2012, Advanced Lithography.