Petra Hegeman

Characterization of a novel double-gas-jet laser plasma EUV source

Andrzej Bartnik, Henryk Fiedorowicz, Rene de Bruijn, 2000, Advanced Lithography.

Extended-source interferometry for at-wavelength testing of EUV optics

Joseph J. M. Braat, Petra Hegeman, Matthieu Visser, 1999, Advanced Lithography.

Portable diagnostics for EUV light sources

R. Stuik, Petra Hegeman, Raluca C. Constantinescu, 2000, SPIE Optics + Photonics.

Shearing interferometer to characterize EUV optics with a laser plasma source

Petra Hegeman, Raluca C. Constantinescu, Eric Louis, 2000, Advanced Lithography.

Laser-generated water plasma source for extreme-ultraviolet lithography and at-wavelength interferometry

Petra Hegeman, Raluca C. Constantinescu, Matthieu Visser, 2000, SPIE Optics + Photonics.